Filmetrics F3-sX optical film thickness gauge
Product Introduction of Filmetrics F3-sX Optical Film Thickness Gauge
Filmetrics F3-sX optical film thickness gaugeBy using the principle of spectral reflection, it is possibleThe measured thickness reaches 3 millimetersA wide range of semiconductor and dielectric thin films. Compared with thinner film layers, the surface of this thick film is rougher and uneven. F3-sX series film thickness gaugeConfigure a measurement spot of 10 micronsThus, it is easy to measure film layers that other film thickness measuring instruments cannot, and it can be completed in just a fraction of a second. The F3-sX film thickness gauge performs exceptionally well in Si wafer thickness measurement, protective coating, IC chip failure analysis, thick photoresist, and other aspects.
Product features and advantages of Filmetrics F3-sX optical thick film thickness gauge
Non-contact measurement: Avoids damaging the film, suitable for fragile or sensitive materials;
Multi-scenario applicability: Basically, smooth, semi-transparent or low absorption coefficient films can all be measured.
Fast measurement speed: After configuration is completed, the measurement can be finished within seconds.
Near-infrared light (NIR) is used to measure the thickness of the film layer, so some film layers that are opaque to the naked eye can be tested
The accessories include an automatic drawing platform, a measurement point visualization camera, and a visible light extended band option
The measurement principle of the Filmetrics F3-sX optical film thickness gauge product:
When incident light passes through the interfaces of different substances, some of the light will be reflected. Due to the wave nature of light, the reflected light from multiple interfaces interferes with each other, causing the multi-wavelength spectrum of the reflected light to oscillate. From the oscillation frequency of the spectrum, the distance between different interfaces can be determined, and thus the thickness of the material can be obtained (the more oscillations, the greater the thickness). At the same time, other material properties such as refractive index and roughness can also be obtained.
Filmetrics F3-sX optical film thickness gauge production application and film layer examples:
Film characteristicsThickness, reflectance, transmittance, optical constant, uniformity, etching amount, etc
Types of filmsTransparent and semi-transparent films, commonly such as oxides, polymers and even air
Film stateSolid, liquid and gaseous films can all be measured
Thin film structureSingle-layer film, multi-layer film; Plane, curved surface
Common industrial applications of Filmetrics F3-sX optical film thickness gauge products:
Semiconductor film layer | Display technology | Consumer electronics | Parrylin |
Photoresist | OLED | Waterproof coating | Electronic products/circuit boards |
Dielectric layer | ITO and TCOs | Radio Frequency Identification | Magnetic material |
Gallium arsenide | Thick air box | Solar cell | Medical devices |
Micro-electromechanical system | PVD and CVD | Aluminum shell anode film | Silicone rubber |
Product parameters of Filmetrics F3-sX Optical Film Thickness Gauge
Wavelength range | 1280-1340nm | Light source | 200KMTBFSLED |
Thickness measurement range n=1.5 | 15um-2mm | Thickness measurement range n=3.5: | 7um-1mm |
Spot size | The standard working distance is 53mm | Measurement accuracy | 5nm |
Measurement diagram of Filmetrics F3-sX optical film thickness gauge
